Patent · US Active

Illumination system having a beam deflection array for illuminating a mask in a microlithographic projection exposure apparatus

US10241416B2 · kind B2 · utility

0Cited by

8References

19Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Markus Deguenther · Aalen, DE
Michael Layh · Altusried, DE

Key dates

Filing date	Mar 13, 2015
Grant date	Mar 26, 2019
Priority date	—
Expiry date	Sep 19, 2037

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70116
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An illumination system for illuminating a mask in a scanning microlithographic projection exposure apparatus has an objective with an object plane, at least one pupil surface and an image plane in which a mask can be arranged. A beam deflection array of reflective or transparent beam deflection elements is provided, where each beam deflection element is adapted to deflect an impinging light ray by a deflection angle that is variable in response to a control signal. The beam deflection elements are arranged in or in close proximity to the object plane of the objective.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.