Lithography apparatus and a method of manufacturing a device
US10241422B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Feb 16, 2016 |
| Grant date | Mar 26, 2019 |
| Priority date | — |
| Expiry date | Feb 16, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/709
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithography apparatus includes: a projection system configured to project a desired image onto a substrate; an active module that generates a time-varying heat load; a temperature conditioning system configured to maintain a component of the lithography apparatus at a predetermined target temperature; and a heat buffer including a phase change material in thermal contact with the active module, the phase change material having a phase change temperature such that the phase change material is caused to undergo a phase change by the time-varying heat load, and wherein the phase change material is stationary relative to the projection system during critical operations of the lithography apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.