Lithographic apparatus and device manufacturing method involving a heater
US10254663B2 · kind B2 · utility
Assignee
Inventors
- Theodorus Petrus Maria Cadee
- Johannes Henricus Wilhelmus Jacobs
- Nicolaas Ten Kate
- Erik Roelof Loopstra
- Aschwin Lodewijk Hendricus Johannes Van Meer
- Jeroen Johannes Sophia Maria Mertens
- Christianus Gerardus Maria De Mol
- Marcel Johannus Elisabeth Hubertus Muitjens
- Antonius Johannus Van Der Net
- Joost Jeroen Ottens
- Johannes Anna Quaedackers
- Maria Elisabeth Reuhman-Huisken
- Marco Koert Stavenga
- Patricius Aloysius Jacobus Tinnemans
- Martinus Cornelis Maria Verhagen
- Jacobus Johannus Leonardus Hendricus Verspay
- Frederik Eduard De Jong
- Koen Goorman
- Boris Menchtchikov
- Herman Boom
- Stoyan Nihtianov
- Richard Moerman
- Martin Frans Pierre Smeets
- Bart Leonard Peter Schoondermark
- Franciscus Johannes Joseph Janssen
- Michel Riepen
Key dates
| Filing date | Oct 13, 2015 |
| Grant date | Apr 9, 2019 |
| Priority date | — |
| Expiry date | May 26, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70875
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a substrate temperature control system configured to provide a control signal to control a substrate temperature conditioning system based on a determined temperature; and a parameter control system configured to adjust a lithographic apparatus parameter, that is other than, or in addition to, the control signal, based on temperature information of the substrate and/or substrate table or on a measure derived from the temperature information.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.