Gas flow process control system and method using crystal microbalance(s)
US10256126B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 22, 2016 |
| Grant date | Apr 9, 2019 |
| Priority date | — |
| Expiry date | Oct 17, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/006
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Disclosed are process control systems and methods incorporating a crystal microbalance (CM) (e.g., a quartz crystal microbalance (QCM)) into gas flow line(s) entering and/or exiting a processing chamber. A CM measures the resonance of a quartz crystal sensor contained therein as gas flows over that crystal sensor and can, thereby be used to accurately monitor, in real time, the mass flow rate of the gas. The mass flow rate may indicate that gas contamination has occurred and, in response, a controller can cause the gas flow to stop. Additionally, the mass flow rate may indicate the desired result will not be achieved within the processing chamber and, in response, advanced process control (APC) can be performed (e.g., the controller can adjust the gas flow). CM(s) incorporated into gas flow lines entering and/or exiting a processing chamber can provide precise measurements for process monitoring at minimal cost.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.