Patent · US Active

Projection exposure apparatus with a highly flexible manipulator

US10261425B2 · kind B2 · utility

1Cited by

1References

21Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Alexander Wolf · Oberkochen, DE
Toralf Gruner · Hennef (Sieg), DE
Boris Bittner · Roth, DE
Norbert Wabra · Werneck, DE

Key dates

Filing date	Aug 27, 2015
Grant date	Apr 16, 2019
Priority date	—
Expiry date	Nov 8, 2035

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70891
WIPO fieldOptics
WIPO sectorInstruments

Abstract

The invention relates to a projection exposure apparatus for semiconductor lithography, comprising at least one manipulator for reducing image aberrations, wherein the manipulator has at least two optical elements that can be positioned relative to one another, wherein at least one of the optical elements is spatially dependent in terms of its effect on an optical wavefront passing therethrough such that a local phase change of a wavefront propagating in the optical system is produced in the case of a relative movement of the optical elements against one another. Here, the spatially dependent effect of the at least one optical element can be set in a reversible dynamic manner.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.