Workpiece processing chamber having a thermal controlled microwave window
US10269541B2 · kind B2 · utility
65Cited by
17References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 2, 2014 |
| Grant date | Apr 23, 2019 |
| Priority date | — |
| Expiry date | Feb 16, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32522
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma reactor has a microwave source including a microwave window with a channel extending through the window and a coolant source for flowing a coolant through the channel. The coolant is a liquid that does not absorb microwave power.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.