Patent · US Active

Surface treatment of carbon containing films using organic radicals

US10269574B1 · kind B1 · utility

10Cited by

9References

25Claims

0Family size

Assignee

Mattson Technology, Inc. · US

Inventors

Michael X. Yang · Palo Alto, US
Hua Chung · San Jose, US
Xinliang Lu · Fremont, US

Key dates

Filing date	Apr 20, 2018
Grant date	Apr 23, 2019
Priority date	—
Expiry date	Apr 20, 2038

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/332
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

Surface treatment processes for treating a workpiece with organic radicals are provided. In one example implementation, a method for processing a workpiece having a semiconductor material and a carbon containing layer (e.g., photoresist) can include a surface treatment process on the workpiece. The surface treatment process can include generating one or more species in a first chamber (e.g., a plasma chamber). The surface treatment process can include mixing one or more hydrocarbon radicals with the species to create a mixture. The surface treatment process can include exposing the carbon containing layer to the mixture in a second chamber (e.g., a processing chamber).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.