Patent · US Active

Chamber leak and gas contaimination detection

US10269601B2 · kind B2 · utility

0Cited by

0References

16Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Shuo Na · Sunnyvale, US
Patrick L. Smith · Vancouver, US
Ilias Iliopoulos · Paris, FR
Songfu Jiang · Shenyang, CN
Bo Zhang · Shanghai, CN

Key dates

Filing date	Sep 26, 2016
Grant date	Apr 23, 2019
Priority date	—
Expiry date	Nov 28, 2036

Classification

Technology area (CPC H)Electricity
CPC primaryH01L21/67288
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

Embodiments presented herein provide techniques for controlling deposition processes in a process chamber based on monitoring contaminant gas levels in a chamber. Embodiments include generating a data model defining acceptable levels within the chamber for each of a plurality of gas types. Gas levels of the plurality of gas types within the chamber are monitored using one or more sensor devices within the chamber. Upon determining that at least one gas level within the chamber violates the acceptable level for the respective gas type within the data model, embodiments perform a corrective action for the chamber.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.