Patent · US Active

Top lamp module for carousel deposition chamber

US10273578B2 · kind B2 · utility

0Cited by
6References
17Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 3, 2014
Grant dateApr 30, 2019
Priority date
Expiry dateDec 4, 2036

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC23C16/46
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A heating module for use in a substrate processing chamber. The heating module having a housing with a heat source therein. The heating module can be part of a gas distribution assembly positioned above a susceptor assembly to heat the top surface of the susceptor and wafers directly. The heating module can have constant or variable power output. Processing chambers and methods of processing a wafer using the heating module are described.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.