Lithography patterning with sub-resolution assistant patterns and off-axis illumination
US10274818B2 · kind B2 · utility
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Key dates
| Filing date | Jun 9, 2017 |
| Grant date | Apr 30, 2019 |
| Priority date | — |
| Expiry date | Jun 29, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70441
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photolithography system includes a substrate stage for holding a workpiece, and a mask having main patterns and sub-resolution assistant patterns. The system further includes a diffractive optical element (DOE) for directing a radiation having an aerial image of the main patterns onto the workpiece. The DOE includes a first pair of poles that is positioned symmetrically about a center of the DOE along a first direction. The main patterns are oriented lengthwise along a second direction that is perpendicular to the first direction. The sub-resolution assistant patterns are oriented lengthwise along the first direction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.