Metrology target for combined imaging and scatterometry metrology
US10274837B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 12, 2015 |
| Grant date | Apr 30, 2019 |
| Priority date | — |
| Expiry date | Mar 30, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2201/12
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Metrology targets, design files, and design and production methods thereof are provided. The targets comprise two or more parallel periodic structures at respective layers, wherein a predetermined offset is introduced between the periodic structures, for example, opposite offsets at different parts of a target. Quality metrics are designed to estimate the unintentional overlay from measurements of a same metrology parameter by two or more alternative measurement algorithms. Target parameters are configured to enable both imaging and scatterometry measurements and enhance the metrology measurements by the use of both methods on the same targets. Imaging and scatterometry target parts may share elements or have common element dimensions. Imaging and scatterometry target parts may be combined into a single target area or may be integrated into a hybrid target using a specified geometric arrangement.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.