Substrate table, lithographic apparatus and method of operating a lithographic apparatus
US10317804B2 · kind B2 · utility
0Cited by
1References
20Claims
0Family size
Assignee
Inventors
- Daan Daniel Johannes Antonius Van Sommeren
- Coen Hubertus Matheus Baltis
- Harold Sebastiaan Buddenberg
- Giovanni Luca Gattobigio
- Johannes Cornelis Paulus Melman
- Günes NAKIBOGLU
- Theodorus Wilhelmus Polet
- Walter Theodorus Matheus STALS
- Yuri Johannes Gabriël Van De Vijver
- Josephus Peter Van Lieshout
- Jorge Alberto Vieyra Salas
- Aleksandar Nikolov Zdravkov
Key dates
| Filing date | Nov 2, 2016 |
| Grant date | Jun 11, 2019 |
| Priority date | — |
| Expiry date | Nov 2, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70716
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface, wherein at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.