Patent · US Active

Geometric control of bottom-up pillars for patterning applications

US10319591B2 · kind B2 · utility

2Cited by

1References

20Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Ziqing Duan · Sunnyvale, US
Abhijit Basu Mallick · Palo Alto, US

Key dates

Filing date	Nov 7, 2017
Grant date	Jun 11, 2019
Priority date	—
Expiry date	Nov 7, 2037

Classification

Technology area (CPC H)Electricity
CPC primaryH01L21/76897
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

Processing methods comprising selectively replacing a first pillar material with a second pillar material in a self-aligned process are described. The first pillar material may be grown orthogonally to the substrate surface and replaced with a second pillar material to leave a substantially similar shape and alignment as the first pillar material.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.