Patent · US Active

Precursors for deposition of metal, metal nitride and metal oxide based films of transition metals

US10323054B2 · kind B2 · utility

0Cited by

0References

18Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Benjamin Schmiege · Santa Clara, US
Jeffrey W. Anthis · San Jose, US
David Thompson · San Jose, US

Key dates

Filing date	Nov 28, 2017
Grant date	Jun 18, 2019
Priority date	—
Expiry date	Nov 28, 2037

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC07F15/06
WIPO fieldOrganic fine chemistry
WIPO sectorChemistry

Abstract

Metal coordination complexes comprising a metal atom coordinated to at least one aza-allyl ligand having the structure represented by: where each R1-R4 are independently selected from the group consisting of H, branched or unbranched C1-C6 alkyl, branched or unbranched C1-C6 alkenyl, branched or unbranched C1-C6 alkynyl, cycloalkyl groups having in the range of 1 to 6 carbon atoms, silyl groups and halogens. Methods of depositing a film using the metal coordination complex and a suitable reactant are also described.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.