Patent · US Active

Multi-function x-ray metrology tool for production inspection/monitoring of thin films and multidimensional structures

US10330612B2 · kind B2 · utility

4Cited by

0References

20Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Lin Zhang · Qiaonanxiang, CN
Shuran Sheng · Sunnyvale, US
Andrew V. LE · San Jose, US

Key dates

Filing date	Oct 22, 2014
Grant date	Jun 25, 2019
Priority date	—
Expiry date	Mar 26, 2036

Classification

Technology area (CPC H)Electricity
CPC primaryH01L22/12
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

An apparatus for integrating metrology and method for using the same are disclosed. The apparatus includes a multi-chamber system having a transfer chamber, a deposition chamber, an etch chamber and a metrology chamber, and a robot configured to transfer a substrate between the deposition chamber or etch chamber and the metrology chamber.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.