Patent · US Active

Exposure mask, exposure apparatus and method for calibrating an exposure apparatus

US10331036B2 · kind B2 · utility

0Cited by

1References

17Claims

0Family size

Assignee

Infineon Technologies AG · DE

Inventors

Heiko Assmann · Dresden, DE
Markus Dankelmann · Radeberg, DE
Uwe Winkler · Ettlingen, DE

Key dates

Filing date	May 16, 2017
Grant date	Jun 25, 2019
Priority date	—
Expiry date	May 20, 2037

Classification

Technology area (CPC G)Physics
CPC primaryG03F9/7026
WIPO fieldOptics
WIPO sectorInstruments

Abstract

In various embodiments, an exposure mask may include a carrier, a first exposure structure in a first structure plane of the carrier, and a second exposure structure in a second structure plane of the carrier. The two structure planes differ from one another.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.