Patent · US Active

Mirror, in particular for a microlithographic projection exposure apparatus

US10331048B2 · kind B2 · utility

1Cited by

0References

20Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Oliver Dier · Lauchheim, DE
Kerstin Hild · Schwäbisch Gmünd, DE
Hartmut Enkisch · Aalen, DE
Matus Kalisky · Aalen, DE

Key dates

Filing date	Jan 15, 2018
Grant date	Jun 25, 2019
Priority date	—
Expiry date	Jan 15, 2038

Classification

Technology area (CPC G)Physics
CPC primaryG21K1/062
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A mirror, in particular for a microlithographic projection exposure apparatus, has an optically effective surface, a mirror substrate (205, 305), a reflection layer (220, 320), which is configured to provide the mirror with a reflectivity of at least 50% for electromagnetic radiation with a predetermined operating wavelength incident on the optically effective surface (200a, 300a) at angles of incidence in relation to the respective surface normals of at least 65°, and a substrate protection layer (210, 310) which is arranged between the mirror substrate (205, 305) and the reflection layer (220, 320). The substrate protection layer has a transmission of less than 0.1% for EUV radiation.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.