Oliver Dier
9Patents
1h-index
24Co-inventors
43Inventor score
Filing activity: Apr 16, 2013 → Jan 7, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9442383B2 | EUV-mirror arrangement, optical system with EUV-mirror arrangement and associated operating method | Physics | 3 | Active |
| US10331048B2 | Mirror, in particular for a microlithographic projection exposure apparatus | Physics | 1 | Active |
| US9921483B2 | Surface correction of mirrors with decoupling coating | Physics | 1 | Active |
| US10203435B2 | EUV mirror and optical system comprising EUV mirror | Physics | 1 | Active |
| US9997268B2 | EUV-mirror, optical system with EUV-mirror and associated operating method | Physics | 1 | Active |
| US10161808B2 | Method and arrangement for determining the heating condition of a mirror in an optical system | Physics | 1 | Active |
| US10520827B2 | Optical system, in particular for a microlithographic projection exposure apparatus | Physics | 0 | Active |
| US11328831B2 | Method for treating a reflective optical element for the EUV wavelength range, method for producing same, and treating apparatus | Physics | 0 | Active |
| US9915873B2 | Reflective optical element, and optical system of a microlithographic projection exposure apparatus | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.