Patent · US Active

Semiconductor die with improved ruggedness

US10332817B1 · kind B1 · utility

3Cited by
1References
22Claims
0Family size

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Key dates

Filing dateDec 1, 2017
Grant dateJun 25, 2019
Priority date
Expiry dateDec 1, 2037

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D62/8503
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A semiconductor die includes a substrate, a first passivation layer over the substrate, and a second passivation layer over the first passivation layer and the substrate. The substrate has boundaries defined by a substrate termination edge. The first passivation layer is over the substrate such that it terminates at a first passivation termination edge that is inset from the substrate termination edge by a first distance. The second passivation layer is over the first passivation layer and the substrate such that it terminates at a second passivation termination edge that is inset from the substrate termination edge by a second distance. The second distance is less than the first distance such that the second passivation layer overlaps the first passivation layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.