Scott Sheppard
100Patents
27h-index
53Co-inventors
93Inventor score
Filing activity: Apr 17, 1998 → Jun 24, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6316793A | Nitride based transistors on semi-insulating silicon carbide substrates | Electricity | 326 | Expired |
| US7238560B2 | Methods of fabricating nitride-based transistors with a cap layer and a recessed gate | Electricity | 237 | Expired |
| US6982204B2 | Nitride-based transistors and methods of fabrication thereof using non-etched contact recesses | Electricity | 157 | Expired |
| US7548112B2 | Switch mode power amplifier using MIS-HEMT with field plate extension | Electricity | 151 | Active |
| US7045404B2 | Nitride-based transistors with a protective layer and a low-damage recess and methods of fabrication thereof | Electricity | 123 | Expired |
| US6583454B2 | Nitride based transistors on semi-insulating silicon carbide substrates | Electricity | 121 | Expired |
| US6486502B1 | Nitride based transistors on semi-insulating silicon carbide substrates | Electricity | 121 | Expired |
| US7875910B2 | Integrated nitride and silicon carbide-based devices | Electricity | 119 | Active |
| US7125786B2 | Method of forming vias in silicon carbide and resulting devices and circuits | Electricity | 112 | Expired |
| US7419892B2 | Semiconductor devices including implanted regions and protective layers and methods of forming the same | Electricity | 101 | Expired |
| US7875914B2 | Switch mode power amplifier using mis-HEMT with field plate extension | Electricity | 99 | Active |
| US7592211B2 | Methods of fabricating transistors including supported gate electrodes | Electricity | 97 | Active |
| US8049252B2 | Methods of fabricating transistors including dielectrically-supported gate electrodes and related devices | Electricity | 95 | Active |
| US7906799B2 | Nitride-based transistors with a protective layer and a low-damage recess | Electricity | 95 | Expired |
| US7709269B2 | Methods of fabricating transistors including dielectrically-supported gate electrodes | Electricity | 93 | Active |
| US7855401B2 | Passivation of wide band-gap based semiconductor devices with hydrogen-free sputtered nitrides | Electricity | 92 | Active |
| US7709859B2 | Cap layers including aluminum nitride for nitride-based transistors | Electricity | 89 | Active |
| US7901994B2 | Methods of manufacturing group III nitride semiconductor devices with silicon nitride layers | Electricity | 85 | Active |
| US7332795B2 | Dielectric passivation for semiconductor devices | Electricity | 83 | Expired |
| US7465967B2 | Group III nitride field effect transistors (FETS) capable of withstanding high temperature reverse bias test conditions | Electricity | 82 | Expired |
| US7875537B2 | High temperature ion implantation of nitride based HEMTs | Electricity | 76 | Active |
| US7456443B2 | Transistors having buried n-type and p-type regions beneath the source region | Electricity | 76 | Expired |
| US7960756B2 | Transistors including supported gate electrodes | Electricity | 72 | Active |
| US7892974B2 | Method of forming vias in silicon carbide and resulting devices and circuits | Electricity | 71 | Active |
| US7550784B2 | Nitride-based transistors and methods of fabrication thereof using non-etched contact recesses | Electricity | 69 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.