Highly accurate defect identification and prioritization of fault locations
US10338137B1 · kind B1 · utility
2Cited by
12References
18Claims
0Family size
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Key dates
| Filing date | Jul 20, 2016 |
| Grant date | Jul 2, 2019 |
| Priority date | — |
| Expiry date | Sep 2, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01R31/3193
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method for defect identification for an integrated circuit includes determining a defect ranking technique, applying at least two defect identification techniques and generating a defect report corresponding to each technique, comparing the defect reports and generating probable defect locations, prioritizing the probable defect locations according to the defect ranking technique; and generating a report of the prioritized probable defect locations.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.