Patent · US Active

Highly accurate defect identification and prioritization of fault locations

US10338137B1 · kind B1 · utility

2Cited by
12References
18Claims
0Family size

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Key dates

Filing dateJul 20, 2016
Grant dateJul 2, 2019
Priority date
Expiry dateSep 2, 2036

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01R31/3193
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A method for defect identification for an integrated circuit includes determining a defect ranking technique, applying at least two defect identification techniques and generating a defect report corresponding to each technique, comparing the defect reports and generating probable defect locations, prioritizing the probable defect locations according to the defect ranking technique; and generating a report of the prioritized probable defect locations.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.