Vapor phase deposition of organic films
US10343186B2 · kind B2 · utility
44Cited by
57References
22Claims
0Family size
Assignee
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Key dates
| Filing date | Mar 15, 2016 |
| Grant date | Jul 9, 2019 |
| Priority date | — |
| Expiry date | Mar 15, 2036 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05D2505/50
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Methods and apparatus for vapor deposition of an organic film are configured to vaporize an organic reactant at a first temperature, transport the vapor to a reaction chamber housing a substrate, and maintain the substrate at a lower temperature than the vaporization temperature. Alternating contact of the substrate with the organic reactant and a second reactant in a sequential deposition sequence can result in bottom-up filling of voids and trenches with organic film in a manner otherwise difficult to achieve. Deposition reactors conducive to depositing organic films are provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.