Lithography optics adjustment and monitoring
US10345714B2 · kind B2 · utility
1Cited by
8References
30Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 12, 2017 |
| Grant date | Jul 9, 2019 |
| Priority date | — |
| Expiry date | Jun 12, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01J2001/4247
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Methods and apparatus for processing an image of a beam generated by an optical system to extract information indicative of an extent of damage to optical elements in the optical system. Also disclosed is a beam image and analysis tool capable of acquiring an image of a beam at any one of a number of locations.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.