Patent · US Active

Lithographic apparatus and method

US10345717B2 · kind B2 · utility

0Cited by

3References

23Claims

0Family size

Assignee

ASML NETHERLANDS B.V. · NL

Inventors

Günes NAKIBOGLU · Eindhoven, NL
Suzanne Johanna Antonetta Geertruda Cosijns · Casteren, NL
Anne Willemijn Bertine Quist · Eindhoven, NL
Lukasz Sosniak · 's-Hertogenbosch, NL
Frank Johannes Jacobus Van Boxtel · Eindhoven, NL
Engelbertus Antonius Fransiscus Van Der Pasch · Oirschot, NL

Key dates

Filing date	Apr 20, 2018
Grant date	Jul 9, 2019
Priority date	—
Expiry date	Apr 20, 2038

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/709
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A lithographic apparatus includes an optical sensor, a movable body, a support, a deflector system, a first drive system and a second drive system. The movable body is moveable relative to the sensor. The support is for holding the sensor. The first drive system is arranged to move the movable body relative to the sensor. The second drive system is arranged to move the first drive system relative to the sensor. The second drive system is arranged to move the deflector system relative to the sensor. A disturbance is induced by a movement of the movable body. The deflector system is arranged to create a deflecting area for reflecting the disturbance away from the support.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.