Surface treatment of silicon or silicon germanium surfaces using organic radicals
US10354883B2 · kind B2 · utility
3Cited by
10References
24Claims
0Family size
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Key dates
| Filing date | Apr 20, 2018 |
| Grant date | Jul 16, 2019 |
| Priority date | — |
| Expiry date | Apr 20, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/332
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Processes for surface treatment of a workpiece are provided. In one example implementation, a method can include performing an organic radical based surface treatment process on a workpiece. The organic radical based surface treatment process can include generating one or more species in a first chamber. The surface treatment process can include mixing one or more hydrocarbon molecules with the species to create a mixture. The mixture can include one or more organic radicals. The surface treatment process can include exposing a semiconductor material on the workpiece to the mixture in a second chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.