Indirect determination of a processing parameter
US10359705B2 · kind B2 · utility
6Cited by
1References
20Claims
0Family size
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Key dates
| Filing date | Sep 21, 2016 |
| Grant date | Jul 23, 2019 |
| Priority date | — |
| Expiry date | Sep 21, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/12
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method including measuring a value of a directly measureable processing parameter of a patterning process from a portion of a substrate produced by the patterning process; obtaining a relationship between the directly measureable processing parameter and a not directly measureable processing parameter; and determining a value of the not directly measureable processing parameter from the value of the directly measureable processing parameter and the relationship.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.