Film deposition using precursors containing amidoimine ligands
US10364492B2 · kind B2 · utility
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20Claims
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Key dates
| Filing date | Oct 16, 2014 |
| Grant date | Jul 30, 2019 |
| Priority date | — |
| Expiry date | Apr 19, 2035 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/45553
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Methods are provided for deposition of films comprising manganese on surfaces using metal coordination complexes comprising an amidoimino-based ligand. Certain methods comprise exposing a substrate surface to a manganese precursor, and exposing the substrate surface to a co-reagent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.