Ravi Kanjolia
16Patents
3h-index
28Co-inventors
60Inventor score
Filing activity: Feb 22, 1990 → Mar 11, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9175023B2 | Molybdenum allyl complexes and use thereof in thin film deposition | Chemistry; Metallurgy | 17 | Active |
| US5603988A | Method for depositing a titanium or tantalum nitride or nitride silicide | Chemistry; Metallurgy | 7 | Expired |
| US9297071B2 | Solid precursor delivery assemblies and related methods | Emerging Cross-Sectional Technologies | 3 | Active |
| US10221481B2 | Metal complexes containing amidoimine ligands | Electricity | 3 | Active |
| US9028917B2 | High molecular weight alkyl-allyl cobalttricarbonyl complexes and use thereof for preparing dielectric thin films | Chemistry; Metallurgy | 3 | Active |
| US5120676A | Use of phosphine and arsine compounds in chemical vapor deposition and chemical doping | Emerging Cross-Sectional Technologies | 2 | Expired |
| US8272626B2 | Bubbler for the transportation of substances by a carrier gas | Chemistry; Metallurgy | 2 | Active |
| US4999223A | Chemical vapor deposition and chemicals with diarsines and polyarsines | Emerging Cross-Sectional Technologies | 1 | Expired |
| US11312730B2 | Metal complexes containing cyclopentadienyl ligands | Electricity | 1 | Active |
| US8481121B2 | Methods of forming thin metal-containing films by chemical phase deposition | Chemistry; Metallurgy | 1 | Active |
| US8476467B2 | Organometallic precursors for use in chemical phase deposition processes | Chemistry; Metallurgy | 1 | Active |
| US10155783B2 | Manganese complexes and use thereof for preparing thin films | Performing Operations; Transporting | 1 | Active |
| US10723749B2 | Metal complexes containing allyl ligands | Chemistry; Metallurgy | 0 | Active |
| US12286449B2 | Metal complexes containing cyclopentadienyl ligands | Electricity | 0 | Active |
| US8927748B2 | Alkyl-substituted allyl carbonyl metal complexes and use thereof for preparing dielectric thin films | Electricity | 0 | Active |
| US10364492B2 | Film deposition using precursors containing amidoimine ligands | Chemistry; Metallurgy | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.