System and method for calibration of optical signals in semiconductor process systems
US10365212B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 2, 2017 |
| Grant date | Jul 30, 2019 |
| Priority date | — |
| Expiry date | Nov 2, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2482
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The disclosure provides an optical calibration device for in-chamber calibration of optical signals associated with a processing chamber, a characterization system for plasma processing chambers, methods of characterizing plasma processing chambers, and a chamber characterizer. In one example, the optical calibration device includes: (1) an enclosure, (2) an optical source located within the enclosure and configured to provide a source light having a continuous spectrum, and (3) optical shaping elements located within the enclosure and configured to form the source light into a calibrating light that approximates a plasma emission during an operation within the processing chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.