Selective deposition through formation of self-assembled monolayers
US10366878B2 · kind B2 · utility
1Cited by
3References
16Claims
0Family size
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Key dates
| Filing date | May 5, 2017 |
| Grant date | Jul 30, 2019 |
| Priority date | — |
| Expiry date | Jul 27, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/76849
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Methods of depositing a film selectively onto a first substrate surface relative to a second substrate surface are described. The methods include net chemisorption of a self-assembled monolayer on the second surface to prevent deposition of the film on the second surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.