Inventor · Sunnyvale, CA, US

Tobin Kaufman-Osborn

29Patents
3h-index
40Co-inventors
59Inventor score

Filing activity: Oct 24, 2013 → Oct 17, 2023

Most-cited inventions

PatentTitleAreaCited byStatus
US10358715B2 Integrated cluster tool for selective area deposition Electricity 11 Active
US9716005B1 Plasma poisoning to enable selective deposition Electricity 5 Active
US10134585B2 Low temperature atomic layer deposition of oxides on compound semiconductors Electricity 4 Active
US10192752B2 Self-assembled monolayer blocking with intermittent air-water exposure Electricity 3 Active
US10847337B2 Side inject designs for improved radical concentrations Electricity 2 Active
USD924825S1 Chamber inlet General 2 Active
US11486038B2 Asymmetric injection for better wafer uniformity Electricity 2 Active
US11610776B2 Method of linearized film oxidation growth Electricity 1 Active
US10947621B2 Low vapor pressure chemical delivery Chemistry; Metallurgy 1 Active
US11066747B2 Chemical delivery chamber for self-assembled monolayer processes Performing Operations; Transporting 1 Active
US10366878B2 Selective deposition through formation of self-assembled monolayers Electricity 1 Active
US9117653B2 Method for in-situ dry cleaning, passivation and functionalization of Ge semiconductor surfaces Electricity 0 Active
US12261039B2 Method of linearized film oxidation growth Electricity 0 Active
US12139790B2 Processing system and method of delivering a reactant gas Electricity 0 Active
US10954594B2 High temperature vapor delivery system and method Electricity 0 Active
US11732355B2 Method and apparatus for supplying improved gas flow to a processing volume of a processing chamber Electricity 0 Active
US10483097B2 Method for cleaning, passivation and functionalization of Si—Ge semiconductor surfaces Electricity 0 Active
US10818510B2 Self-assembled monolayer blocking with intermittent air-water exposure Electricity 0 Active
US11501945B2 Side inject designs for improved radical concentrations Electricity 0 Active
US11735420B2 Wafer treatment for achieving defect-free self-assembled monolayers Electricity 0 Active
USD1023987S1 Chamber inlet General 0 Active
US11697875B2 Method and apparatus for supplying improved gas flow to a processing volume of a processing chamber General 0 Revoked
US11959169B2 Asymmetric injection for better wafer uniformity Electricity 0 Active
US11725274B2 Integrated cluster tool for selective area deposition Electricity 0 Active
US12291779B2 Methods of selective atomic layer deposition Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.