Hotspot aware dose correction
US10372043B2 · kind B2 · utility
3Cited by
10References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 11, 2015 |
| Grant date | Aug 6, 2019 |
| Priority date | — |
| Expiry date | Feb 12, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70633
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic apparatus, the method including: obtaining a relationship of a characteristic of one or more features in the portion with respect to dose; obtaining a value of the characteristic; and obtaining a target dose based on the value of the characteristic and the relationship.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.