Metrology method, target and substrate
US10379445B2 · kind B2 · utility
6Cited by
13References
20Claims
0Family size
Assignee
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Key dates
| Filing date | Oct 30, 2018 |
| Grant date | Aug 13, 2019 |
| Priority date | — |
| Expiry date | Oct 30, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7076
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method, involving illuminating at least a first periodic structure of a metrology target with a first radiation beam having a first polarization, illuminating at least a second periodic structure of the metrology target with a second radiation beam having a second different polarization, combining radiation diffracted from the first periodic structure with radiation diffracted from the second periodic structure to cause interference, detecting the combined radiation using a detector, and determining a parameter of interest from the detected combined radiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.