Patent · US Active

Surface-treated copper foil

US10383222B2 · kind B2 · utility

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38Claims
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Key dates

Filing dateJan 4, 2017
Grant dateAug 13, 2019
Priority date
Expiry dateAug 24, 2037

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH05K2201/0355
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

To provide a surface-treated copper foil that is excellent in adhesiveness to an insulating substrate at ordinary temperature, and is capable of suppressing the formation of blister on application of a thermal load of reflow soldering to a copper-clad laminate board constituted by the copper foil. A surface-treated copper foil having a surface-treated surface, the surface-treated copper foil satisfying one or more of the following conditions (1) to (3): by an XPS measurement at a depth after sputtering from the surface-treated surface for 0.5 min at a rate of 1.1 nm/min (SiO2 conversion), (1) the N concentration is from 1.5 to 7.5 atomic %; (2) the C concentration is from 12 to 30 atomic %; and (3) the Si concentration is 3.1 atomic % or more and the O concentration is from 40 to 48 atomic %.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.