Geometry vectorization for mask process correction
US10386726B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 29, 2017 |
| Grant date | Aug 20, 2019 |
| Priority date | — |
| Expiry date | Jan 4, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG05B13/048
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Various aspects include vectorization approaches for model-based mask proximity correction (MPC). In some cases, a computer-implemented method includes: assigning a set of vectors to geometry data describing at least one mask for forming an integrated circuit (IC); adjusting a statistical predictive model of the at least one mask based upon the set of vectors and the geometry data; predicting an adjustment to the at least one mask with the statistical predictive model; and adjusting instructions for forming the at least one mask in response to a predicted mask result of the statistical predictive model deviating from a target mask result for the at least one mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.