Inventor · Clifton Park, NY, US

Guoxiang Ning

42Patents
2h-index
60Co-inventors
56Inventor score

Filing activity: Feb 11, 2009 → Jan 11, 2021

Most-cited inventions

PatentTitleAreaCited byStatus
US10199271B1 Self-aligned metal wire on contact structure and method for forming same Electricity 6 Active
US8907496B1 Circuit structures and methods of fabrication with enhanced contact via electrical connection Electricity 4 Active
US10896874B2 Interconnects separated by a dielectric region formed using removable sacrificial plugs Electricity 2 Active
US9500945B1 Pattern classification based proximity corrections for reticle fabrication Physics 2 Active
US10386726B2 Geometry vectorization for mask process correction Physics 2 Active
US10957701B1 Fin-based anti-fuse device for integrated circuit (IC) products, methods of making such an anti-fuse device and IC products comprising such an anti-fuse device Electricity 2 Active
US10892222B1 Anti-fuse for an integrated circuit (IC) product and method of making such an anti-fuse for an IC product Electricity 2 Active
US9236301B2 Customized alleviation of stresses generated by through-substrate via(S) Electricity 1 Active
US9250538B2 Efficient optical proximity correction repair flow method and apparatus Physics 1 Active
US10423078B1 FinFET cut isolation opening revision to compensate for overlay inaccuracy Electricity 1 Active
US10002827B2 Method for selective re-routing of selected areas in a target layer and in adjacent interconnecting layers of an IC device Emerging Cross-Sectional Technologies 1 Active
US9606432B2 Alternating space decomposition in circuit structure fabrication Physics 1 Active
US9368453B2 Overlay mark dependent dummy fill to mitigate gate height variation Electricity 1 Active
US10714422B2 Anti-fuse with self aligned via patterning Electricity 1 Active
US9329471B1 Achieving a critical dimension target based on resist characteristics Physics 1 Active
US9645486B2 Multiple threshold convergent OPC model Physics 0 Active
US10332745B2 Dummy assist features for pattern support Electricity 0 Active
US10727120B2 Controlling back-end-of-line dimensions of semiconductor devices Electricity 0 Active
US10804170B2 Device/health of line (HOL) aware eBeam based overlay (EBO OVL) structure Electricity 0 Active
US9672313B2 Method for selective re-routing of selected areas in a target layer and in adjacent interconnecting layers of an IC device Emerging Cross-Sectional Technologies 0 Active
US9136223B2 Forming alignment mark and resulting mark Electricity 0 Active
US9384318B2 Mask error compensation by optical modeling calibration Physics 0 Active
US9817940B2 Method wherein test cells and dummy cells are included into a layout of an integrated circuit Emerging Cross-Sectional Technologies 0 Active
US11651992B2 Gap fill void and connection structures Electricity 0 Active
US7923180B2 Cross technology reticles Physics 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.