Patent · US Active

Method, program product and apparatus for predicting line width roughness and resist pattern failure and the use thereof in a lithography simulation process

US10386730B2 · kind B2 · utility

0Cited by
9References
23Claims
0Family size

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Key dates

Filing dateSep 23, 2011
Grant dateAug 20, 2019
Priority date—
Expiry dateApr 12, 2035

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/70625
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A method of generating a model for simulating the imaging performance of an optical imaging system. The method includes the steps of defining the optical imaging system and a process to be utilized by the optical imaging system; defining a first model representing the imaging performance of the optical imaging system and the process, and calibrating the model, where the first model generates values corresponding to a latent image slope. The method further includes the step of defining a second model for estimating a line width roughness of a feature to be imaged, where the second model utilizes the latent image slope values to estimate the line width roughness.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.