Patent · US Active

Magnetic tunnel junction wafer adaptor used in magnetic annealing furnace and method of using the same

US10388861B1 · kind B1 · utility

0Cited by
102References
26Claims
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Key dates

Filing dateMar 8, 2018
Grant dateAug 20, 2019
Priority date
Expiry dateMar 8, 2038

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10N50/10
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

Semiconductor substrate adaptor configured to adapt a substrate of a first dimension to a second dimension, such that the substrate can be properly supported by a supporting mechanism (e.g., a wafer cassette) customized for substrates of the second dimension. The substrate adaptor may be made of quartz. The combination of the substrate adaptor and a substrate fitting therein causes no perturbation in various aspects of a semiconductor process. Therefore, the substrate adaptor conveniently enables a substrate of the first dimension to be processed in the same processing equipment and conditions as a substrate of the second dimension. A vertical substrate adaptor may have a semicircular body with a semicircular cutout for accommodating a wafer and can support a wafer vertically. A horizontal substrate adaptor may have a circular body with a circular cutout for accommodating an entire wafer and supporting the wafer horizontally.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.