Patent · US Active

Polishing apparatus, control method and recording medium

US10391603B2 · kind B2 · utility

2Cited by
6References
19Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 14, 2016
Grant dateAug 27, 2019
Priority date
Expiry dateJan 13, 2038

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB24B37/20
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

A polishing object is prevented from slipping out without depending on the process type or the polishing condition. A polishing apparatus for polishing a surface to be polished of an polishing object by sliding the surface to be polished and a polishing member relative to each other, including: a pressing unit that presses a back surface of the surface to be polished of the polishing object such that the surface to be polished is pressed against the polishing member; a retainer member that is arranged on an outer side of the pressing unit and presses the polishing member; a storage unit that stores information concerning a condition for preventing the polishing object from slipping out, the condition being defined by use of information concerning a pressing force of the retainer member; and a control unit that acquires information concerning a force of friction between the surface to be polished of the polishing object and the polishing member or information concerning the pressing force of the retainer member, and executes control for adapting to the condition for preventing the slipping-out by using the acquired information concerning the force of friction or the acquired informa…

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.