Microlithographic illumination unit

US10394129B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Markus Deguenther · Aalen, DE
• Stig Bieling · Aalen, DE

Key dates

• Filing date: Dec 4, 2018
• Grant date: Aug 27, 2019
• Expiry date: Dec 4, 2038

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/7045
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A microlithographic illumination unit for post-exposure of a photoresist provided on a wafer in a microlithography process, has at least one light source and a light-guiding and light-mixing element for coupling the electromagnetic radiation generated by the light source into the photoresist. This light-guiding and light-mixing element has a first pair of mutually opposite side faces, the maximum spacing of which has a first value. Multiple reflections of the electromagnetic radiation on these side faces take place, wherein the light-guiding and light-mixing element has a second pair of mutually opposite side faces, the maximum spacing of which has a second value. The maximum extent of the light-guiding and light-mixing element in the light propagation direction of the electromagnetic radiation has a third value. This third value is greater than the first value and is smaller than the second value.