Generating risk inventory and common process window for adjustment of manufacturing tool
US10401837B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 29, 2017 |
| Grant date | Sep 3, 2019 |
| Priority date | — |
| Expiry date | Dec 6, 2037 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P90/02
- WIPO fieldControl
- WIPO sectorInstruments
Abstract
A method disclosed herein includes: converting an image of a manufactured circuit to a plurality of representative contours, the plurality of representative contours corresponding to printed features in the manufactured circuit; generating a risk inventory for the manufactured circuit based on the plurality of representative contours, the risk inventory being configured to identify at least one process sensitive geometry (PSG) in the manufactured circuit; generating a common process window (CPW) for the manufactured circuit based on the plurality of representative contours and the risk inventory, the CPW being indicative of manufacturing reliability of each feature in the manufactured circuit; and generating instructions to adjust a manufacturing tool for creating the manufactured circuit, based on the generated CPW.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.