Tunable multi-zone gas injection system
US10403475B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 4, 2015 |
| Grant date | Sep 3, 2019 |
| Priority date | — |
| Expiry date | Dec 29, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3344
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A tunable multi-zone injection system for a plasma processing system for plasma processing of substrates such as semiconductor wafers. The injector can include an on-axis outlet supplying process gas at a first flow rate to a central zone and off-axis outlets supplying the same process gas at a second flow rate to an annular zone surrounding the central zone. The arrangement permits modification of gas delivery to meet the needs of a particular processing regime by allowing independent adjustment of the gas flow to multiple zones in the chamber. In addition, compared to consumable showerhead arrangements, a removably mounted gas injector can be replaced more easily and economically.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.