Method for illuminating an object field of a projection exposure system
US10409167B2 · kind B2 · utility
0Cited by
1References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 2, 2016 |
| Grant date | Sep 10, 2019 |
| Priority date | — |
| Expiry date | Aug 2, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B26/0833
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for illuminating an object field of a projection exposure apparatus includes providing a subset of first facets to be positioned in park positions, which are each spaced apart from an associated target position, but at most by a maximum distance.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.