Lars Wischmeier
4Patents
0h-index
12Co-inventors
31Inventor score
Filing activity: Jun 5, 2013 → Oct 26, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9448490B2 | EUV lithography system | Physics | 0 | Active |
| US11720028B2 | Measurement illumination optical unit for guiding illumination light into an object field of a projection exposure system for EUV lithography | Physics | 0 | Active |
| US10409167B2 | Method for illuminating an object field of a projection exposure system | Physics | 0 | Active |
| US9874819B2 | Mirror array | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.