Optical metrology of lithographic processes using asymmetric sub-resolution features to enhance measurement
US10417359B2 · kind B2 · utility
2Cited by
11References
26Claims
0Family size
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Key dates
| Filing date | Dec 14, 2016 |
| Grant date | Sep 17, 2019 |
| Priority date | — |
| Expiry date | Feb 10, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F2111/10
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A process of calibrating a model, the process including: obtaining training data including: scattered radiation information from a plurality of structures, individual portions of the scattered radiation information being associated with respective process conditions being characteristics of a patterning process of the individual structures; and calibrating a model with the training data by determining a ratio relating a change in one of the process characteristics to a corresponding change in scattered radiation information.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.