Robert John Socha
38Patents
10h-index
32Co-inventors
75Inventor score
Filing activity: Aug 13, 1981 → Jul 16, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6871337B2 | Illumination optimization for specific mask patterns | Physics | 53 | Expired |
| US7506299B2 | Feature optimization using interference mapping lithography | Physics | 24 | Active |
| US8356261B1 | Determining the gradient and hessian of the image log slope for design rule optimization for accelerating source mask optimization (SMO) | Physics | 22 | Active |
| US7398508B2 | Eigen decomposition based OPC model | Physics | 19 | Expired |
| US8751979B1 | Determining the gradient and Hessian of the image log slope for design rule optimization for accelerating source mask optimization (SMO) | Physics | 15 | Active |
| US7292315B2 | Optimized polarization illumination | Physics | 15 | Expired |
| US6887625B2 | Assist features for use in lithographic projection | Physics | 14 | Expired |
| US7864301B2 | Source and mask optimization by changing intensity and shape of the illumination source | Physics | 14 | Active |
| US7594199B2 | Method of optical proximity correction design for contact hole mask | Physics | 13 | Expired |
| US8572521B2 | Method for performing pattern decomposition for a full chip design | Physics | 12 | Active |
| US4342271A | Stitch length range indicating arrangement in a multiple pattern sewing machine | Physics | 9 | Expired |
| US7493589B2 | Method, program product and apparatus for model based geometry decomposition for use in a multiple exposure process | Physics | 8 | Active |
| US7548302B2 | Lithographic apparatus and device manufacturing method | Physics | 6 | Active |
| US10670973B2 | Coloring aware optimization | Physics | 6 | Active |
| US7865865B2 | Method, program product and apparatus for performing decomposition of a pattern for use in a DPT process | Physics | 5 | Active |
| US8730452B2 | Source and mask optimization by changing intensity and shape of the illumination source and magnitude and phase of mask diffraction orders | Physics | 5 | Active |
| US7639864B2 | Method, program product and apparatus for optimizing illumination for full-chip layer | Physics | 4 | Active |
| US8640058B2 | Method, program product and apparatus for model based geometry decomposition for use in a multiple exposure process | Physics | 3 | Active |
| US10054862B2 | Inspection apparatus, inspection method, lithographic apparatus, patterning device and manufacturing method | Physics | 3 | Active |
| US8060842B2 | Method, program product and apparatus for model based geometry decomposition for use in a multiple exposure process | Physics | 3 | Active |
| US10437158B2 | Metrology by reconstruction | Physics | 2 | Active |
| US8340394B2 | Method, program product and apparatus for performing a model based coloring process for geometry decomposition for use in a multiple exposure process | Physics | 2 | Active |
| US10417359B2 | Optical metrology of lithographic processes using asymmetric sub-resolution features to enhance measurement | Physics | 2 | Active |
| US7710544B2 | Optimized polarization illumination | Physics | 1 | Active |
| US10132763B2 | Inspection method and apparatus, lithographic system and device manufacturing method | Electricity | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.