Substrate treatment method using a block copolymer containing a hydrophilic and a hydrophobic polymers
US10418242B2 · kind B2 · utility
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Key dates
| Filing date | Sep 15, 2015 |
| Grant date | Sep 17, 2019 |
| Priority date | — |
| Expiry date | Jan 1, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/46
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A substrate treatment method of treating a substrate using a block copolymer containing a hydrophilic polymer and a hydrophobic polymer, includes: a resist pattern formation step of forming a predetermined resist pattern by a resist film on the substrate; a thin film formation step of forming a thin film for suppressing deformation of the resist pattern on a surface of the resist pattern; a block copolymer coating step of applying a block copolymer to the substrate after the formation of the thin film; and a polymer separation step of phase-separating the block copolymer into the hydrophilic polymer and the hydrophobic polymer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.