Gen You
17Patents
2h-index
26Co-inventors
50Inventor score
Filing activity: Aug 15, 2008 → May 25, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8084372B2 | Substrate processing method and computer storage medium | Electricity | 448 | Active |
| US9662685B2 | Substrate processing apparatus, substrate processing method, fluid supplying method and storage medium | Electricity | 3 | Active |
| US9583330B2 | Supercritical drying method for semiconductor substrate and supercritical drying apparatus | Mechanical Engineering; Lighting; Heating | 2 | Active |
| US10046370B2 | Substrate processing apparatus, substrate processing method, fluid supplying method and storage medium | Electricity | 2 | Active |
| US8771429B2 | Supercritical drying method for semiconductor substrate and supercritical drying apparatus | Mechanical Engineering; Lighting; Heating | 1 | Active |
| US8372212B2 | Supercritical drying method and apparatus for semiconductor substrates | Mechanical Engineering; Lighting; Heating | 1 | Active |
| US10096462B2 | Substrate processing method and storage medium | Electricity | 1 | Active |
| US10207349B2 | High-pressure container, substrate processing apparatus, and method for manufacturing high-pressure container | Performing Operations; Transporting | 1 | Active |
| US10199240B2 | Substrate processing method, substrate processing apparatus, and storage medium | Electricity | 1 | Active |
| US12283489B2 | Etching method and etching apparatus | Electricity | 0 | Active |
| US9741583B2 | Substrate treatment method, computer readable storage medium and substrate treatment system | Emerging Cross-Sectional Technologies | 0 | Active |
| US10329144B2 | Substrate treatment method, computer storage medium and substrate treatment system | Performing Operations; Transporting | 0 | Active |
| US9911621B2 | Method for processing target object | Electricity | 0 | Active |
| US12272541B2 | Etching method and etching apparatus | Electricity | 0 | Active |
| US11764070B2 | Etching method and etching apparatus | Electricity | 0 | Active |
| US11574812B2 | Computer storage medium to perform a substrate treatment method using a block copolymer containing a hydrophilic and hydrophobic copolymers | Electricity | 0 | Active |
| US10418242B2 | Substrate treatment method using a block copolymer containing a hydrophilic and a hydrophobic polymers | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.