Radiation source, metrology apparatus, lithographic system and device manufacturing method
US10420197B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Feb 5, 2018 |
| Grant date | Sep 17, 2019 |
| Priority date | — |
| Expiry date | Feb 5, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J61/545
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A radiation source apparatus comprising: a container for being pressurized with a gaseous medium in which plasma which emits plasma emitted radiation is generated following excitation of the gaseous medium by a driving radiation, wherein said container is operable substantially to remove radiation with a wavelength of 10-400 nm from said plasma emitted radiation before said plasma emitted radiation exits said container as output radiation. In an embodiment the container comprises: an inlet radiation transmitting element operable to transmit said driving radiation from outside said container to inside said container, and an outlet radiation transmitting element operable to transmit at least some of said plasma emitted radiation from inside said container to outside said container as output radiation; wherein at least one of said inlet and outlet radiation transmitting elements comprises a plane parallel plate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.