Martijn Petrus Christianus Van Heumen
14Patents
4h-index
19Co-inventors
53Inventor score
Filing activity: Sep 23, 2014 → Apr 23, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9924585B2 | Radiation source, metrology apparatus, lithographic system and device manufacturing method | Electricity | 6 | Active |
| US10420197B2 | Radiation source, metrology apparatus, lithographic system and device manufacturing method | Electricity | 5 | Active |
| US9814126B2 | Photon source, metrology apparatus, lithographic system and device manufacturing method | Physics | 5 | Active |
| US9913357B2 | Radiation source, metrology apparatus, lithographic system and device manufacturing method | Electricity | 4 | Active |
| US11139141B2 | Systems and methods for thermally conditioning a wafer in a charged particle beam apparatus | Electricity | 3 | Active |
| US11804358B2 | System and methods for thermally conditioning a wafer in a charged particle beam apparatus | Electricity | 1 | Active |
| US11430678B2 | Particle beam inspection apparatus | Electricity | 0 | Active |
| US12249480B2 | Fluid transfer system in a charged particle system | Electricity | 0 | Active |
| US11764027B2 | Systems and methods of cooling objective lens of a charged-particle beam system | Electricity | 0 | Active |
| US12354891B2 | Particle beam inspection apparatus | Electricity | 0 | Active |
| US11996262B2 | Fluid transfer system in a charged particle system | Electricity | 0 | Active |
| US10948421B2 | Laser-driven photon source and inspection apparatus including such a laser-driven photon source | Physics | 0 | Active |
| US12217930B2 | Systems and methods for thermally conditioning a wafer in a charged particle beam apparatus | Electricity | 0 | Active |
| US11942340B2 | Particle beam inspection apparatus | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.